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Effect of Gas Pressure and Gas Flow Rate on the Magnetic Properties of Sputtered Ni and Ni81Fe19 Films

2018 International Conference on Pure and Applied Science

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Title Effect of Gas Pressure and Gas Flow Rate on the Magnetic Properties of Sputtered Ni and Ni81Fe19 Films
Creator Musaab S. Sultan; Technical College of Informatics-Akre, Dohuk Polytechnic University, Kurdistan Region
Subject Physics
Ferromagnetic thin films; Gas flow rates; Gas pressure; Magnetic properties; Magnetron sputtering
Description Magnetic properties of Ni and Ni81Fe19 films prepared by magnetron sputtering under different gas pressures & flow rates with a thicknesses of ~40 nm were investigated using magneto optical Kerr effect magnetometry. Wavelength dispersive X–ray analysis was used also to ascertain the formation of these films. These measurements confirmed that these films were free from contamination of argon atoms/ions. For NiFe films prepared under low gas flow rates, the Ni weight ratios at all gas pressures was found to be higher than the films which were prepared under high gas flow rates and vice versa for the Fe weight ratios. A slight variation in the weight ratios of Ni and Fe across the NiFe films area was noticed. In both Ni and NiFe samples prepared under ˃6 mT, the coercivity was sharply increased by increasing the gas pressure and gas flow rate. These variations were attributed to the increment of the number of collisions of atoms with each other and/or with the gas particles/ions and changes in both the magnetisation behaviour as well as their elemental composition. This article suggested low gas pressure to be used during deposition in order to be used in magnetic devices. Published 01 August 2018DOI: 10.14500/icpas2018.nmt51
Publisher Pure and Applied Science
Date 2018-03-15 09:30:41
Type Peer-reviewed Paper
Format application/pdf
Source Pure and Applied Science; 2018 International Conference on Pure and Applied Science
Language en
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